Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2412-2415

  Shroff, Yashesh ^a   Chen, Yijian ^a   Oldham, William ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; ENERGY GAP; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY; MIRRORS; POLYSILICON; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GERMANIUM; STRESS ANALYSIS; SURFACE PROPERTIES; THERMAL EFFECTS; ULTRAVIOLET RADIATION;

ACTUATION GAP; EXTREME ULTRAVIOLET MASKLESS LITHOGRAPHY; NANOMIRROR ARRAY FABRICATION; PARALLEL PLATE NANOMIRROR ARRAYS; SILICON MIGRATION; STRESS MEASUREMENT;

NANOTECHNOLOGY;

EID: 0035519807     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1417544     Document Type: Article

References (5)

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