Effects of through-focus symmetry in maskless lithography using micromirror arrays

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2738-2742

  Wang, J S ^a   Hafeman, S ^b   Neureuther, A R ^b   Solgaard, O ^a  

^a STANFORD UNIVERSITY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKLESS LITHOGRAPHY; MIRROR CONFIGURATIONS; MULTIPLE-PISTON MIRRORS; OFF-GRID PRINTING;

ARRAYS; COMPUTER SIMULATION; GEOMETRY; MIRRORS; MODULATION; PRINTING;

LITHOGRAPHY;

EID: 29044448357     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2062407     Document Type: Article

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