Fabrication method for elastomer spatial light modulators for short wavelength maskless lithography

Sensors and Actuators, A: Physical

Volumn 114, Issue 2-3, 2004, Pages 528-535

  Wang, Jen Shiang ^a   Jung, Il Woong ^a   Solgaard, Olav ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Deformable viscoelastic layers; Elastomer; EUV lithography; Maskless lithography; Spatial light modulator

Indexed keywords

ELASTOMERS; FABRICATION; IMAGE PROCESSING; IMAGING SYSTEMS; MASKS; MIRRORS; PHOTOLITHOGRAPHY; SILICON WAFERS; VISCOELASTICITY;

DEFORMABLE VISCOELASTIC LAYERS; MASKLESS LITHOGRAPHY;

LIGHT MODULATION;

EID: 4344573017     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2003.12.001     Document Type: Article

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