Optical analysis of mirror based pattern generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 550-559

  Shroff, Yashesh ^a   Chen, Yijian ^a   Oldham, W G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER ARCHITECTURE; DIFFRACTION; IMAGE QUALITY; LITHOGRAPHY; MASKS; OPTICAL SYSTEMS;

NORMALIZED IMAGE LOG SLOPE; OPTICAL PATH DIFFERENCE; PISTON-MOTION MIRRORS;

MIRRORS;

EID: 0141501308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484971     Document Type: Conference Paper

References (5)

1. N. Chokshi, F. Pease, Y. Shroff, Y. Chen, W. Oldham, R. Pease, et. al, "Maskless EUV Lithography", Journal of Vacuum Science and Technology B, Nov. 1999.
2. U. Ljungbald, T. Sandstrom, H. Buhre, P. Durr, H. Lakner, "New architecture for laser pattern generators for 130nm and beyond," 20th Annual BACUS sym. on Photomask Technology, SPIE vol. 4186, pp. 16-21.
3. O. Solgaard, F. Sandejas, D. Bloom, "Deformable grating optical modulator," Optics Letters, vol.17, no.9, 1 May 1992, pp.688-90. USA.
4. Derek Lee, Dave Newmark, Kenny Toh, Phil Flanner, A. R. Neureuther, "SPLAT v. 5.0 user's guide," Memorandum No. UCB/ERL M95/13, 1 March 1995.
5. T. Sandstrom, J. Backlund, N. Eriksson, J. Bengtsson, "SLM lithography: how well can a stepper without masks and one with masks be matched?", Microlithography Conference, SPIE, Santa Clara, 2003.