Pattern generation with SLM imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 38-44

  Sandström, Tor ^a   Askebjer, Per ^a   Sallander, Jesper ^a   Zerne, Raoul ^a   Karawajczyk, Andrzej ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

DUV; Micro mirrors; Pattern generation; Photomasks; SLM

Indexed keywords

IMAGE ANALYSIS; IMAGE QUALITY; LIGHT MODULATION; MIRRORS; PHOTOLITHOGRAPHY;

PATTERN GENERATION;

MASKS;

EID: 0035766247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458312     Document Type: Conference Paper

References (7)

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3. Ljungblad, U. et al., "New Architecture for Laser Pattern Generators for 130 nm and Beyond," SPIE Proc. Vol. 4186, pp. 16-21, SPIE BACUS 2000.
4. Kück, H. et al. "Deformable Micromirror Devices as Phase Modulating High Resolution Light Valves," Proc. of Transducers 1995 and Eurosensors IX, Stockholm 1995, Sensors and Actuators A54 1996.
5. Ljungblad, U. et al., "New Laser Pattern Generator for DUV Using a Spatial Light Modulator," J. of Microelectronic Engineering, Vol. 57/58, 2001.
6. Odselius, L. et al., "Challenging Giga-Feature Pattern Generation," SPIE Proc. Vol. 4562, SPIE BACUS 2001.
7. Sandström, T. et al. "Sigma7100: a New Architecture for Laser Pattern Generators for 130 nm and Beyond," SPIE Proc. Vol. 4409, pp. 270-276, 2001.