Comparison of tilting and piston mirror elements for 65 nm node spatial light modulator optical maskless lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3038-3042

  Watson, G P ^a   Aksyuk, V ^a   Tennant, D M ^a   Cirelli, R A ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NUMERICAL APERTURE (NA); OPTICAL MASKLESS LITHOGRAPHY (OML); PHOTOMASKS; ULTRAVIOLET WAVELENGTH LITHOGRAPHY;

BENDING (DEFORMATION); COMPUTER SIMULATION; IMAGING TECHNIQUES; LIGHT MODULATORS; MATHEMATICAL MODELS; MIRRORS; PHASE SHIFT; PHOTOLITHOGRAPHY; PISTONS; SEMICONDUCTOR MATERIALS;

LIGHT MODULATION;

EID: 12444327704     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1824063     Document Type: Conference Paper

References (10)

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10. This has also been noted recently by W. Oldham (unpublished, Jan. 2004).