Silicon dioxide films by RF sputtering for microelectronic and MEMS applications

Journal of Micromechanics and Microengineering

Volumn 17, Issue 5, 2007, Pages 1066-1077

  Bhatt, Vivekanand ^a   Chandra, Sudhir ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; MEMS; MICROELECTRONICS; SILICON WAFERS; SPUTTER DEPOSITION; STRESS ANALYSIS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS;

DEPOSITION PARAMETERS; DIODE SPUTTERING; ETCH RATE; MASKING;

SILICA;

EID: 34247498636     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/5/029     Document Type: Article

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