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Applied Surface Science

Volumn 99, Issue 3, 1996, Pages 237-243

Properties of radio frequency magnetron sputtered silicon dioxide films

(2) Wu, Wen Fa a Chiou, Bi Shiou a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; FILM PREPARATION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; OXYGEN; RESIDUAL STRESSES; THERMAL EXPANSION; WEAR RESISTANCE;

FILM DEPOSITION RATE; RADIOFREQUENCY MAGNETRON SPUTTERING;

SILICA;

EID: 0030196087 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(96)00103-1 Document Type: Article

Times cited : (35)

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