Optical and mechanical properties of reactively sputtered silicon dioxide films

Semiconductor Science and Technology

Volumn 11, Issue 9, 1996, Pages 1317-1321

  Wu, Wen Fa ^a   Chiou, Bi Shiou ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CRYSTAL STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; OXYGEN; REFRACTIVE INDEX; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING STATES; PULL OFF STRENGTH; REACTIVE SPUTTERING METHOD; SCRATCH ADHESION; SILICON DIOXIDE FILMS; X RAY PHOTOEMISSION SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0030247689     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/11/9/012     Document Type: Article

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