Stress evaluation of RF sputtered silicon dioxide films for MEMS

Indian Journal of Pure and Applied Physics

Volumn 45, Issue 4, 2007, Pages 377-381

  Bhatt, Vivekanand ^a   Chandra, Sudhir ^a   Kumar, Sushil ^b   Rauthan, C M S ^b   Dixit, P N ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Cantilever beams; RF sputtering; Silicon dioxide; Stress measurement

Indexed keywords

EID: 34247535341     PISSN: 00195596     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (10)

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