Reliability aspects of Hf-based capacitors: Breakdown and trapping effects

Microelectronics Reliability

Volumn 47, Issue 4-5 SPEC. ISS., 2007, Pages 497-500

  Duschl, R ^a   Kerber, M ^a   Avellan, A ^b   Jakschik, S ^b   Schroeder, U ^b   Kudelka, S ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; HAFNIUM; LEAKAGE CURRENTS; RELIABILITY; VOLTAGE MEASUREMENT;

ACCELERATION MODELS; CURRENT DEGRADATION; TRAPPING EFFECTS; VOLTAGE STRESS;

CAPACITORS;

EID: 34247156639     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2007.01.017     Document Type: Article

References (10)

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