Residual stress measurement on a MEMS structure with high-spatial resolution

Journal of Microelectromechanical Systems

Volumn 16, Issue 2, 2007, Pages 365-372

  Sabaté, Neus ^a,c   Vogel, Dietmar ^a   Gollhardt, Astrid ^a   Keller, Jürgen ^a   Cané, Carles ^b   Gràcia, Isabel ^b   Morante, Joan R ^c   Michel, Bernd ^a  

^a FRAUNHOFER IZM   (Germany)

^b INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Microreliability; Residual stress

Indexed keywords

DRILLING; FOCUSED ION BEAMS; MICROSTRUCTURE; MILLING (MACHINING); NEMS; RESIDUAL STRESSES;

DIGITAL IMAGE CORRELATION; HIGH RESOLUTION MICROGRAPHS; MICRORELIABILITY;

MEMS;

EID: 34147187304     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2006.879701     Document Type: Article

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