-
2
-
-
0024129796
-
Silicon fusion bonding for pressure sensors
-
Hilton Head Island, SC, Jun
-
K. E. Peterson and P. Barth, "Silicon fusion bonding for pressure sensors," in Tech. Dig. Solid State Sens. Actuator Workshop, Hilton Head Island, SC, Jun. 1988, pp. 144-147.
-
(1988)
Tech. Dig. Solid State Sens. Actuator Workshop
, pp. 144-147
-
-
Peterson, K.E.1
Barth, P.2
-
3
-
-
0034317743
-
MEMS post-packaging by localized heating and bonding
-
L. Lin, "MEMS post-packaging by localized heating and bonding," J. Microelectromech. Syst., vol. 23, pp. 608-616, 2000.
-
(2000)
J. Microelectromech. Syst
, vol.23
, pp. 608-616
-
-
Lin, L.1
-
4
-
-
0032687820
-
Low pressure and low temperature hermetic wafer bonding using microwave heating
-
Orlando, FL, Jan
-
N. K. Budraa, H. W. Jackson, M. Barmatz, W. T. Pike, and J. D. Mai, "Low pressure and low temperature hermetic wafer bonding using microwave heating," in Tech. Dig. IEEE Conf. Micro Electro Mech. Syst., Orlando, FL, Jan. 1999, pp. 490-492.
-
(1999)
Tech. Dig. IEEE Conf. Micro Electro Mech. Syst
, pp. 490-492
-
-
Budraa, N.K.1
Jackson, H.W.2
Barmatz, M.3
Pike, W.T.4
Mai, J.D.5
-
5
-
-
0002764092
-
Fine grained polysilicon and its application to planar pressure sensor
-
Tokyo, Japan, Jun
-
H. Guckel, D. W. Burns, C. R. Rutigliano, D. K. Showers, and J. Uglow, "Fine grained polysilicon and its application to planar pressure sensor," in Tech. Dig. Int. Conf. Solid-State Sens. Actuators, Tokyo, Japan, Jun. 1987, pp. 277-82.
-
(1987)
Tech. Dig. Int. Conf. Solid-State Sens. Actuators
, pp. 277-282
-
-
Guckel, H.1
Burns, D.W.2
Rutigliano, C.R.3
Showers, D.K.4
Uglow, J.5
-
6
-
-
0025417076
-
Three-dimensional micromachining of silicon pressure sensor integrating resonant strain gauge on diaphragm
-
K. Ikeda, H. Kuwayama, T. Kobayashi, T. Watanabe, T. Nishikawa, T. Yoshida, and K. Harada, "Three-dimensional micromachining of silicon pressure sensor integrating resonant strain gauge on diaphragm," Sens. Actuators A, Phys., vol. 23, pp. 1007-1010, 1990.
-
(1990)
Sens. Actuators A, Phys
, vol.23
, pp. 1007-1010
-
-
Ikeda, K.1
Kuwayama, H.2
Kobayashi, T.3
Watanabe, T.4
Nishikawa, T.5
Yoshida, T.6
Harada, K.7
-
7
-
-
84975634949
-
Microfabricated incandescent lamps
-
C. H. Mastrangelo, R. S. Muller, and S. Kumar, "Microfabricated incandescent lamps," Appl. Opt., vol. 30, pp. 868-873, 1993.
-
(1993)
Appl. Opt
, vol.30
, pp. 868-873
-
-
Mastrangelo, C.H.1
Muller, R.S.2
Kumar, S.3
-
8
-
-
0010271566
-
Vacuum-encapsulated lateral microresonators
-
Yokohama, Japan, Jun
-
L. Lin, K. M. McNair, R. T. Howe, and A. P. Pisano, "Vacuum-encapsulated lateral microresonators," in Tech. Dig. Int. Conf. Solid-State Sens. Actuators, Yokohama, Japan, Jun. 1993, pp. 270-273.
-
(1993)
Tech. Dig. Int. Conf. Solid-State Sens. Actuators
, pp. 270-273
-
-
Lin, L.1
McNair, K.M.2
Howe, R.T.3
Pisano, A.P.4
-
9
-
-
0009715506
-
Cavity-micromachining technology: Zero-package solution for inertial sensors
-
Munich, Germany, Jun. 10-14
-
R. Aigner, K.-G. Oppermann, H. Kapels, and S. Kolb, ""Cavity-micromachining" technology: Zero-package solution for inertial sensors," in Tech. Dig. Int. Conf. Solid-State Sens. Actuators, Munich, Germany, Jun. 10-14, 2001, pp. 186-189.
-
(2001)
Tech. Dig. Int. Conf. Solid-State Sens. Actuators
, pp. 186-189
-
-
Aigner, R.1
Oppermann, K.-G.2
Kapels, H.3
Kolb, S.4
-
10
-
-
0012976489
-
Planar-processed tungsten and polysilicon vacuum microelectronic devices with integral cavity sealing
-
Q. Mei, T. Tamagawa, C. Ye, Y. Lin, S. Zurn, and D. L. Polla, "Planar-processed tungsten and polysilicon vacuum microelectronic devices with integral cavity sealing," J. Vac. Sci. Technol. B, vol. 11, pp. 493-496, 1993.
-
(1993)
J. Vac. Sci. Technol. B
, vol.11
, pp. 493-496
-
-
Mei, Q.1
Tamagawa, T.2
Ye, C.3
Lin, Y.4
Zurn, S.5
Polla, D.L.6
-
11
-
-
0031163814
-
Vacuum sealing of microcavities using metal evaporation
-
M. Bartek, J. A. Foerster, and R. F. Wolffenbuttel, "Vacuum sealing of microcavities using metal evaporation," Sens. Actuators A, Phys., vol. 61, pp. 364-368, 1997.
-
(1997)
Sens. Actuators A, Phys
, vol.61
, pp. 364-368
-
-
Bartek, M.1
Foerster, J.A.2
Wolffenbuttel, R.F.3
-
12
-
-
1942436715
-
A low-temperature thin-film electroplated metal vacuum package
-
B. H. Stark and K. Najafi, "A low-temperature thin-film electroplated metal vacuum package," J. Microelectromech. Syst., vol. 13, pp. 147-157, 2004.
-
(2004)
J. Microelectromech. Syst
, vol.13
, pp. 147-157
-
-
Stark, B.H.1
Najafi, K.2
-
13
-
-
0142165226
-
Single wafer encapsulation of MEMS devices
-
R. N. Candler, W.-T. Park, H. Li, G. Yama, A. Partridge, M. Lutz, and T. W. Kenny, "Single wafer encapsulation of MEMS devices," IEEE Trans. Adv. Packag., vol. 26, pp. 227-232, 2003.
-
(2003)
IEEE Trans. Adv. Packag
, vol.26
, pp. 227-232
-
-
Candler, R.N.1
Park, W.-T.2
Li, H.3
Yama, G.4
Partridge, A.5
Lutz, M.6
Kenny, T.W.7
-
14
-
-
4344692139
-
Stable thin film encapsulation of acceleration sensors using polycrystalline silicon as sacrificial and encapsulation layer
-
A. Hochst, R. Scheuerer, H. Stahl, F. Fischer, L. Metzger, R. Reichenbach, F. Larmer, S. Kronmler, S. Watcham, and C. Rusu, "Stable thin film encapsulation of acceleration sensors using polycrystalline silicon as sacrificial and encapsulation layer," Sens. Actuators A vol. 114, pp. 355-361, 2004.
-
(2004)
Sens. Actuators A
, vol.114
, pp. 355-361
-
-
Hochst, A.1
Scheuerer, R.2
Stahl, H.3
Fischer, F.4
Metzger, L.5
Reichenbach, R.6
Larmer, F.7
Kronmler, S.8
Watcham, S.9
Rusu, C.10
-
15
-
-
0025603567
-
Mechanical integrity of polysilicon films exposed to hydrofluoric acid solutions
-
Napa Valley, CA, Jan
-
J. A. Walker, K. J. Gabriel, and M. Mehregany, "Mechanical integrity of polysilicon films exposed to hydrofluoric acid solutions," in Tech. Dig. IEEE Conf. Micro Electro Mech. Syst., Napa Valley, CA, Jan. 1990, pp. 56-60.
-
(1990)
Tech. Dig. IEEE Conf. Micro Electro Mech. Syst
, pp. 56-60
-
-
Walker, J.A.1
Gabriel, K.J.2
Mehregany, M.3
-
16
-
-
0029510931
-
Permeable polysilicon etch access windows for microshell fabrication
-
Stockholm, Sweden, Jun
-
K. S. Lebouitz, R. T. Howe, and A. P. Pisano, "Permeable polysilicon etch access windows for microshell fabrication," in Tech. Dig. Int. Conf. Solid-State Sens. Actuator, Stockholm, Sweden, Jun. 1995, pp. 224-227.
-
(1995)
Tech. Dig. Int. Conf. Solid-State Sens. Actuator
, pp. 224-227
-
-
Lebouitz, K.S.1
Howe, R.T.2
Pisano, A.P.3
-
17
-
-
0032678755
-
Vacuum encapsulation of resonant devices using permeable polysilicon
-
Orlando, FL, Jan
-
K. S. Lebouitz, A. Mazaheri, R. T. Howe, and A. P. Pisano, "Vacuum encapsulation of resonant devices using permeable polysilicon," in Tech. Dig. IEEE Conf. Microelectromech. Syst., Orlando, FL, Jan. 1999, pp. 470-475.
-
(1999)
Tech. Dig. IEEE Conf. Microelectromech. Syst
, pp. 470-475
-
-
Lebouitz, K.S.1
Mazaheri, A.2
Howe, R.T.3
Pisano, A.P.4
-
18
-
-
0042388263
-
Microfabrication using one-step LPCVD porous polysilicon films
-
G. M. Dougherty, T. D. Sands, and A. P. Pisano, "Microfabrication using one-step LPCVD porous polysilicon films," J. Microelectromech. Syst. vol. 12, pp. 418-24, 2003.
-
(2003)
J. Microelectromech. Syst
, vol.12
, pp. 418-424
-
-
Dougherty, G.M.1
Sands, T.D.2
Pisano, A.P.3
-
19
-
-
0035341519
-
Polysilicon vibrating gyroscope vacuum-encapsulated in an on-chip micro chamber
-
T. Tsuchiya, Y. Kageyama, H. Funabashi, and J. Sakata, "Polysilicon vibrating gyroscope vacuum-encapsulated in an on-chip micro chamber," Sens. Actuators A, Phys., vol. 90, pp. 49-55, 2001.
-
(2001)
Sens. Actuators A, Phys
, vol.90
, pp. 49-55
-
-
Tsuchiya, T.1
Kageyama, Y.2
Funabashi, H.3
Sakata, J.4
-
20
-
-
0842288131
-
UHF micromechanical extensional wine-glass mode ring resonators
-
Washington, D.C, Dec
-
Y. Xie, S.-S. Li, Y.-W. Lin, Z. Ren, and C. T.-C. Nguyen, "UHF micromechanical extensional wine-glass mode ring resonators," in Tech. Dig. IEEE Int. Electron Devices Meeting, Washington, D.C., Dec. 2003, pp. 953-956.
-
(2003)
Tech. Dig. IEEE Int. Electron Devices Meeting
, pp. 953-956
-
-
Xie, Y.1
Li, S.-S.2
Lin, Y.-W.3
Ren, Z.4
Nguyen, C.T.-C.5
-
21
-
-
26844450638
-
On-chip hermetic packaging enabled by post-deposition electrochemical etching of polysilicon
-
Miami, FL, Jan
-
R. He and C.-J. Kim, "On-chip hermetic packaging enabled by post-deposition electrochemical etching of polysilicon," in Tech. Dig. IEEE Conf. Micro Electro Mech. Syst., Miami, FL, Jan. 2005, pp. 544-547.
-
(2005)
Tech. Dig. IEEE Conf. Micro Electro Mech. Syst
, pp. 544-547
-
-
He, R.1
Kim, C.-J.2
-
22
-
-
0028385324
-
Porous polycrystalline silicon: A new material for MEMS
-
R. C. Anderson, R. S. Muller, and C. W. Tobias, "Porous polycrystalline silicon: A new material for MEMS," J. Microelectromech. Syst., vol. 3, pp. 10-18, 1994.
-
(1994)
J. Microelectromech. Syst
, vol.3
, pp. 10-18
-
-
Anderson, R.C.1
Muller, R.S.2
Tobias, C.W.3
-
23
-
-
34147129331
-
3-dimensional half-cell microbatteries
-
Anaheim, CA, Nov, IMECE2004-61925
-
F. Chamran, Y. Yeh, B. Dunn, and C.-J. Kim, "3-dimensional half-cell microbatteries," in Proc. ASME Int. Mech. Eng. Congr. Expo., Anaheim, CA, Nov. 2004, vol. 2, IMECE2004-61925.
-
(2004)
Proc. ASME Int. Mech. Eng. Congr. Expo
, vol.2
-
-
Chamran, F.1
Yeh, Y.2
Dunn, B.3
Kim, C.-J.4
-
24
-
-
0000663462
-
Study of luminescent porous polycrystalline silicon thin films
-
P. G. Han, M. C. Poon, P. K. Ko, J. K. O. Sin, and H. Wong, "Study of luminescent porous polycrystalline silicon thin films," J. Vac. Sci. Technol. B, vol. 14, pp. 824-6, 1996.
-
(1996)
J. Vac. Sci. Technol. B
, vol.14
, pp. 824-826
-
-
Han, P.G.1
Poon, M.C.2
Ko, P.K.3
Sin, J.K.O.4
Wong, H.5
-
25
-
-
33644910106
-
Porous silicon formation mechanisms
-
R. L. Smith and S. D. Collins, "Porous silicon formation mechanisms," J. Appl. Phys., vol. 71, pp. R1-R22, 1992.
-
(1992)
J. Appl. Phys
, vol.71
-
-
Smith, R.L.1
Collins, S.D.2
-
26
-
-
0025440924
-
Microstructure and lattice distortion of anodized porous silicon layers
-
H. Sugiyama and O. Nittono, "Microstructure and lattice distortion of anodized porous silicon layers," J. Cryst. Growth, vol. 103, pp. 156-163, 1990.
-
(1990)
J. Cryst. Growth
, vol.103
, pp. 156-163
-
-
Sugiyama, H.1
Nittono, O.2
-
27
-
-
0038155575
-
A doubly anchored surface micromachined Pirani gauge for vacuum package characterization
-
Kyoto, Japan, Jan
-
B. H. Stark, Y. Mei, C. Zhang, and K. Najafi, "A doubly anchored surface micromachined Pirani gauge for vacuum package characterization," in Tech. Dig. IEEE Conf. Micro Electro Mech. Syst., Kyoto, Japan, Jan. 2003, pp. 506-509.
-
(2003)
Tech. Dig. IEEE Conf. Micro Electro Mech. Syst
, pp. 506-509
-
-
Stark, B.H.1
Mei, Y.2
Zhang, C.3
Najafi, K.4
-
28
-
-
0003713895
-
Thermal applications of microbridges,
-
Ph.D. dissertation, Dept. of Electr. Eng. Comput. Sci, Univ. of California, Berkeley, CA
-
C. H. Mastrangelo, "Thermal applications of microbridges," Ph.D. dissertation, Dept. of Electr. Eng. Comput. Sci., Univ. of California, Berkeley, CA, 1991.
-
(1991)
-
-
Mastrangelo, C.H.1
-
29
-
-
0033149765
-
Sealing of micromachined cavities using chemical vapor deposition methods: Characterization and optimization
-
C. Liu and Y.-C. Tai, "Sealing of micromachined cavities using chemical vapor deposition methods: Characterization and optimization," J. Microelectromech. Syst., vol. 8, pp. 135-145, 1999.
-
(1999)
J. Microelectromech. Syst
, vol.8
, pp. 135-145
-
-
Liu, C.1
Tai, Y.-C.2
-
30
-
-
34147098161
-
Oxide thickness determination by XPS, AES, RBS, SIMS and TEM
-
D. A. Cole, S. W. Novak, R. L. Moore, M. J. Edgell, S. P. Smith, C. J. Hitzman, J. F. Kirchoff, S. B. E. Principe, R. J. Bleiler,W. Nieveen, and K. Jones, "Oxide thickness determination by XPS, AES, RBS, SIMS and TEM," J. Vac. Sci. Technol. B, vol. 18, pp. 79-82, 2000.
-
(2000)
J. Vac. Sci. Technol. B
, vol.18
, pp. 79-82
-
-
Cole, D.A.1
Novak, S.W.2
Moore, R.L.3
Edgell, M.J.4
Smith, S.P.5
Hitzman, C.J.6
Kirchoff, J.F.7
Principe, S.B.E.8
Bleiler, R.J.9
Nieveen, W.10
Jones, K.11
|