Microfabrication using one-step LPCVD porous polysilicon films

Journal of Microelectromechanical Systems

Volumn 12, Issue 4, 2003, Pages 418-423

  Dougherty, George M ^a   Sands, Timothy D ^a   Pisano, Albert P ^b  

^a Lawrence Berkeley National Laboratory   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Encapsulation; Filters; Hollow shells; Low pressure chemical vapor deposition (LPCVD); Membranes; Micromachining; Permeable polysilicon; Porous polysilicon; Sealing; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ENCAPSULATION; MICROMACHINING; POLYSILICON; POROUS MATERIALS; THIN FILMS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROFABRICATION;

MICROELECTROMECHANICAL DEVICES;

EID: 0042388263     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.811730     Document Type: Article

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