Anomalous microphotoluminescence of high-aspect-ratio Si nanopillars formatted by dry-etching Si substrate with self-aggregated Ni nanodot mask

Applied Physics Letters

Volumn 90, Issue 14, 2007, Pages

  Lin, Gong Ru ^a   Lin, Chun Jung ^b   Kuo, Hao Chung ^b   Lin, Huang Sheng ^b   Kao, Chi Chiang ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); DRY ETCHING; INDUCTIVELY COUPLED PLASMA; OXIDATION; PHOTOLUMINESCENCE; REACTIVE ION ETCHING; SILICON;

MICROPHOTOLUMINESCENCE; NANODOT MASKS; NANOPILLARS; SHRINK SIZE;

NANOSTRUCTURED MATERIALS;

EID: 34047273921     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2719152     Document Type: Article

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