|
Volumn 96, Issue 5, 2004, Pages 3025-3027
|
Time-resolved photoluminescence and capacitance-voltage analysis of the neutral vacancy defect in silicon implanted SiO2 on silicon substrate
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ANNEALING;
CAPACITANCE;
CONCENTRATION (PROCESS);
CRYSTAL DEFECTS;
ELECTRIC POTENTIAL;
EXTRAPOLATION;
HOLE TRAPS;
ION IMPLANTATION;
IRRADIATION;
PHOTOLUMINESCENCE;
PRECIPITATION (CHEMICAL);
NANOCRYSTALS;
NEUTRAL OXYGEN VACANCY (NOV);
ROOM TEMPERATURE;
THERMAL OXIDATION;
SILICA;
|
EID: 5044232551
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1775041 Document Type: Article |
Times cited : (55)
|
References (12)
|