메뉴 건너뛰기




Volumn 96, Issue 5, 2004, Pages 3025-3027

Time-resolved photoluminescence and capacitance-voltage analysis of the neutral vacancy defect in silicon implanted SiO2 on silicon substrate

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; CONCENTRATION (PROCESS); CRYSTAL DEFECTS; ELECTRIC POTENTIAL; EXTRAPOLATION; HOLE TRAPS; ION IMPLANTATION; IRRADIATION; PHOTOLUMINESCENCE; PRECIPITATION (CHEMICAL);

EID: 5044232551     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1775041     Document Type: Article
Times cited : (55)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.