Solvent-assisted nanolithography on polystyrene surfaces using the atomic force microscope

Nanotechnology

Volumn 18, Issue 15, 2007, Pages

  Cappella, Brunero ^a   Bonaccurso, Elmar ^b  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^b MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; INDENTATION; NANOLITHOGRAPHY; PLASMAS;

PLASMA TREATMENT; SOLVENT ASSISTED NANOLITHOGRAPHY; TWO DIMENSIONAL ARRAYS;

POLYSTYRENES;

POLYSTYRENE; SOLVENT;

ARTICLE; ATOMIC FORCE MICROSCOPY; METHODOLOGY; NANOTECHNOLOGY; PLASMA; PRIORITY JOURNAL; TECHNIQUE; VELOCITY;

LITHOGRAPHY; PLASMA; POLYSTYRENE;

EID: 33947391731     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/15/155307     Document Type: Article

References (32)

1. Fang T H, Weng C I and Chang J G 2000 Nanotechnology 11 181-7
2. Magno R and Bennett B R 1997 Appl. Phys. Lett. 70 1855-7
3. Bouchiat V and Esteve D 1996 Appl. Phys. Lett. 69 3098-100
4. Sugihara H, Takahara A and Kajiyama T 2001 J. Vac. Sci. Technol. B 19 593-5
5. Loi S, Wiesler U M, Butt H-J and Müllen K 2001 Macromolecules 34 3661-71
6. Baur C, Bugacov A, Koel B E, Madhukar A, Montoya N, Ramachandran T R, Requicha A A G, Resch R and Will P 1998 Nanotechnology 9 360-4
7. Weisenhorn A L, Macdougall J E, Gould S A C, Cox S D, Wise W S, Massie J, Maivald P, Elings V B, Stucky G D and Hansma P K 1990 Science 247 1330-3
8. Parpura V, Haydon P G, Sakaguchi D S and Henderson E 1993 J. Vac. Sci. Technol. A 11 773-5
9. Kim Y and Lieber C M 1992 Science 257 375-7
10. Jaschke M and Butt H-J 1995 Langmuir 11 1061-4
11. Nyffenegger R M and Penner R M 1997 Chem. Rev. 97 1195-230
12. Cappella B, Sturm H and Weidner S M 2002 Polymer 43 4461-6
13. Bonaccurso E and Graf K 2004 Langmuir 20 11183-90
14. Martin C, Rius G, Borrise X and Perez-Murano F 2005 Nanotechnology 16 1016-22
15. Martinez R V and Garcia R 2005 Nano Lett. 5 1161-4
16. Juhl S, Phillips D, Vaia R A, Lyuksyutov S F and Paramonov P B 2004 Appl. Phys. Lett. 85 3836-8
17. Jang S Y, Marquez M and Sotzing G A 2004 J. Am. Chem. Soc. 126 9476-7
18. Lee H, Kim S A and Ahn S J 2002 Appl. Phys. Lett. 81 138-40
19. Jung T A, Moser A, Hug H J, Brodbeck D, Hofer R, Hidber H R and Schwarz U D 1992 Ultramicroscopy 42 1446-51
20. Klehn B and Kunze U 1999 J. Appl. Phys. 85 3897-903
21. Cappella B and Sturm H 2002 J. Appl. Phys. 91 506-12
22. Drechsler D, Karbach A and Fuchs H 1998 Appl. Phys. A 66 S825-9
23. Heyde M, Cappella B, Sturm H, Ritter C and Rademann K 2001 Surf. Sci. 476 54-62
24. Bonaccurso E, Butt H-J and Graf K 2002 Herstellung von Arrays aus Mikroreaktionstöpfen Mittels Lösungsmitteldämpfen German Patent Application 102 53 077.7
25. Bonaccurso E, Butt H J and Graf K 2004 Eur. Polym. J. 40 975-80
26. Bonaccurso E, Cappella B and Graf K 2006 J. Phys. Chem. B 110 17918-24
27. Kaliappan S K and Cappella B 2005 Polymer 46 11416-23
28. Lubarsky G V, Davidson M R and Bradley R H 2004 Surf. Sci. 558 135-44
29. Han Y C, Schmitt S and Friedrich K 1999 Appl. Compos. Mater. 6 1-18
30. Ilyina E and Sillescu H 1995 Polymer 36 137-41
31. Buscher K, Berger R, Brunger W and Graf K 2006 Microelectron. Eng. 83 819-22
32. Zhang R, Graf K and Berger R 2006 Appl. Phys. Lett. at press