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Volumn 43, Issue 16, 2002, Pages 4461-4466

Breaking polymer chains by dynamic plowing lithography

(3) Cappella, B a Sturm, H a Weidner, S M a

a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING (Germany)

Author keywords

AFM; Chain scission; Nanolithography

Indexed keywords

ADHESION; CHEMICAL BONDS; ENERGY DISSIPATION; LITHOGRAPHY; SIZE EXCLUSION CHROMATOGRAPHY; THIN FILMS;

COVALENT BONDS; DYNAMIC PLOWING LITHOGRAPHY (DPL);

POLYSTYRENES;

POLY(METHYL METHACRYLATE); POLYMER; POLYSTYRENE;

ADHESION; ARTICLE; COVALENT BOND; FILM; GEL PERMEATION CHROMATOGRAPHY; HYDROPHILICITY; OXIDATION; SURFACE PROPERTY;

FILM;

EID: 0037054121 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(02)00285-9 Document Type: Article

Times cited : (57)

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