Manufacturability evaluation of model-based OPC masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 520-529

  Jang, Sung Hoon ^a   Zinn, Sonny Y ^a   Ki, Won Tai ^a   Choi, Ji Hyun ^a   Jeon, Chan Uk ^a   Choi, Seong Woon ^a   Yoon, Hee Sun ^a   Sohn, Jung Min ^a   Oh, Yong Ho ^b   Lee, Jai Cheol ^b   Lim, Sungwoo ^b  

^a SAMSUNG Electronics   (South Korea)

^b Wonkwang University   (South Korea)

Author keywords

Model based OPC; Optical proximity correction

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION (OPC);

MASKS;

EID: 0038303181     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468093     Document Type: Conference Paper

References (3)

1. Y.H. Oh, J.C. Lee, and S.W. Lim, "Resolution enhancement through a rule-free optical proximity correction in optical lithography", Journal of the Korean Physical Society, 33, pp. S63-S66, 1998.
2. S.Y. Zinn et al., "Simulation of critical dimension error using Monte Carlo method and its experimental verification", EIPBN Conference, 2002.
3. ETEC, MEBES eXara presentation material, 2002.