Field-emission characteristics of diamond-like amorphous carbon films deposited by mixed gas (N2 or H2) controlled i-C4H10 supermagnetron plasma

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 5142-5146

  Kinoshita, Haruhisa ^a   Yamashita, Manabu ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Chemical vapor deposition; Diamond like amorphous carbon; Field emission; Supermagnetron plasma

Indexed keywords

AMORPHOUS CARBON; CHEMICAL VAPOR DEPOSITION; FIELD EMISSION; MAGNETRON SPUTTERING; MIXING; PLASMA DEPOSITION;

DIAMOND LIKE AMORPHOUS CARBON; RF POWERS; SUPERMAGNETRON PLASMAS; THRESHOLD ELECTRIC FIELDS;

DIAMOND LIKE CARBON FILMS;

EID: 33947106891     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.055     Document Type: Article

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