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Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 314-317

Formation of wide and narrow optical-band-gap amorphous-CN x :H films using i-C 4 H 10 /N 2 supermagnetron plasma

(3) Kinoshita, Haruhisa a Ikuta, Ryo a Sakurai, Katsutoshi a

a SHIZUOKA UNIVERSITY (Japan)

Author keywords

Amorphous CN x :H; Chemical vapor deposition; Plasma processing; Supermagnetron plasma

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRODES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; ION BOMBARDMENT; MAGNETOPLASMA; PHOTOLUMINESCENCE; POLYMERIZATION; REFRACTIVE INDEX;

AMORPHOUS-CNX:H; ION BOMBARDMENT ENERGY; PLASMA PROCESSING; SUPERMAGNETRON PLASMA;

AMORPHOUS FILMS;

EID: 15844405861 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2004.10.083 Document Type: Conference Paper

Times cited : (7)

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