Intermittent chemical vapor deposition of thick electrically conductive diamond-like amorphous carbon films using i-C4H10/N2 supermagnetron plasma

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 403-407

  Kinoshita, Haruhisa ^a   Murakami, Toichi ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CONDUCTIVE FILMS; ELECTRODES; MAGNETRONS; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SILICON WAFERS; SPUTTER DEPOSITION; SUBSTRATES; THICK FILMS;

INTERMITTENT DEPOSITION; SUPERMAGNETRON PLASMA;

DIAMOND LIKE CARBON FILMS;

EID: 0036494284     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1446446     Document Type: Article

References (13)