Brillouin scattering and x-ray photoelectron studies of germanium nanoclusters synthesized in SiO2 by ion implantation

Journal of Applied Physics

Volumn 96, Issue 9, 2004, Pages 4952-4959

  Zuk, J ^a   Krzyzanowska, H ^a   Clouter, M J ^b   Bromberek, M ^b   Bubert, H ^c   Rebohle, L ^d   Skorupa, W ^d  

^a MARIA CURIE SK ODOWSKA UNIVERSITY   (Poland)

^b MEMORIAL UNIVERSITY OF NEWFOUNDLAND   (Canada)

^c LEIBNIZ INSTITUT FÜR ANALYTISCHE WISSENSCHAFTEN ISAS E V   (Germany)

^d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC WAVES; ANNEALING; BRILLOUIN SCATTERING; COMPUTER SIMULATION; CONCENTRATION (PROCESS); ION IMPLANTATION; SILICA; SPUTTERING; SURFACE WAVES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC CONCENTRATIONS; SHEAR MODULI; SPUTTERING PROCESS; SURFACE ACOUSTIC WAVES;

GERMANIUM;

EID: 9744233681     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1794891     Document Type: Article

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