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Applied Physics Letters

Volumn 69, Issue 7, 1996, Pages 984-986

Thermal annealing of implantation-induced compaction for improved silica waveguide performance

(3) Johnson, C M a Ridgway, M C a Leech, P W b

a AUSTRALIAN NATIONAL UNIVERSITY (Australia)

b TELSTRA RESEARCH LABORATORIES (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042609267 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.117103 Document Type: Article

Times cited : (15)

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