Synthesis of carbon nitride thin films on Si(100) surface by using penning-type discharge sputtering technique

Surface and Coatings Technology

Volumn 201, Issue 15, 2007, Pages 6539-6541

  Li, H Y ^a   Shi, Y C ^b   Feng, X P ^c  

^a SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

^b DONGHUA UNIVERSITY   (China)

^c UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

Bond structure; Carbon nitride; Penning type discharge

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; SPUTTERING; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BOND STRUCTURE; PENNING-TYPE DISCHARGE SPUTTERING TECHNIQUE;

CARBON FILMS;

ATOMIC FORCE MICROSCOPY; CARBON FILMS; CARBON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; SPUTTERING; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33847417537     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.070     Document Type: Article

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