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Volumn 9, Issue 3, 2000, Pages 562-565

X-ray photoelectron spectroscopy characterization of CNx thin films deposited by electron beam evaporation and nitrogen ion bombardment

(5) Petrov, Peter a,e Dimitrov, D B b Krastev, V c Georgiev, Ch a Popov, C d

a INSTITUTE OF ELECTRONICS (Bulgaria)

b INSTITUTE OF SOLID STATE PHYSICS (Bulgaria)

c INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY (Bulgaria)

d BULGARIAN ACADEMY OF SCIENCES (Bulgaria)

e BELGIAN NUCLEAR RESEARCH CENTRE (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL BONDS; DEPOSITION; EVAPORATION; GRAPHITE; ION BOMBARDMENT; SILICON; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; ELECTRON BEAM EVAPORATION;

CARBON INORGANIC COMPOUNDS;

EID: 0033729066 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(99)00348-9 Document Type: Article

Times cited : (9)

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