Silicon Etching in HNO3/HF Solution: Charge Balance for the Oxidation Reaction

Electrochemical and Solid-State Letters

Volumn 2, Issue 2-4, 1999, Pages 178-180

  Kooij, E S ^a   Butter, K ^a   Kelly, J J ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ETCHING; HYDROFLUORIC ACID; NITRIC ACID; OXIDATION; SEMICONDUCTING SILICON; SOLUTIONS; VOLTAGE MEASUREMENT;

OPEN-CIRCUIT POTENTIAL;

ELECTROCHEMICAL ELECTRODES;

EID: 0033114855     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390775     Document Type: Article

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