Scanning tunneling microscopy observation of hydrogen-terminated Si(001) surfaces after rinsing in ultrapure water with low dissolved oxygen concentration

Applied Surface Science

Volumn 143, Issue 1, 1999, Pages 16-22

  Usuda, K ^a   Yamada, K ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDROFLUORIC ACID; HYDROGEN; INFRARED RADIATION; MORPHOLOGY; OXIDES; OXYGEN; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACES; WATER;

ATTENUATED TOTAL REFLECTANCE FOURIER TRANSMITTANCE INFRARED; DISSOLVED OXYGEN; PROTRUSIONS; RINSING; ULTRAPURE WATER;

SILICON;

EID: 0032664776     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00098-7     Document Type: Article

References (8)

1. Usuda K., Kanaya H., Yamada K. Appl. Phys. Lett. 64:1994;3240.
2. Usuda K., Yamada K. J. Electrochem. Soc. 144(9):1997;3204.
3. Becker R.S., Higashi G.S., Chabal Y.J., Becker A.J. Phys. Rev. Lett. 65:1990;1917.
4. Hessel H.E., Feltz A., Reiter M., Memmert U., Behm R.J. Chem. Phys. Lett. 186:1991;275.
5. Morita Y., Miki K., Tokumoto H. Jpn. J. Appl. Phys. 30:1991;3570.
6. T. Ohmi, in: Extended Abstracts, The Electrochemical Society 188th Meeting 95-2 (1995) 680.
7. Kanaya H., Usuda K., Yamada K. Appl. Phys. Lett. 67:1995;682.
8. Dumas P., Chabal Y.J., Jakob P. Surf. Sci. 269/270:1992;867.