Silicon-based nanomembrane materials: The ultimate in strain engineering

2006 Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems - Digest of Papers

Volumn 2006, Issue , 2006, Pages 327-333

  Yuan, Hao Chih ^a   Roberts, Michelle M ^a   Zhang, Pengpeng ^a   Park, Byoung Nam ^a   Klein, Levente J ^a   Savage, Donald E ^a   Flack, Frank S ^a   Ma, Zhenqiang ^a   Evans, Paul G ^a   Eriksson, Mark A ^a   Celler, George K ^b   Eagally, Max G ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Soitec USA   (United States)

Author keywords

2DEG; Elastic strain relief; Flexible electronics; Si nanomembrane; Strained Si; Thin film transistor

Indexed keywords

2DEG; ELASTIC STRAIN RELIEF; FLEXIBLE ELECTRONICS; SI NANOMEMBRANES; STRAINED SI;

ELECTRON GAS; GERMANIUM; SCANNING TUNNELING MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; TRANSCONDUCTANCE; X RAY DIFFRACTION;

NANOSTRUCTURED MATERIALS;

EID: 33847040436     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMIC.2005.1587986     Document Type: Conference Paper

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