Elastic strain relaxation in free-standing SiGe/Si structures

Applied Physics Letters

Volumn 84, Issue 7, 2004, Pages 1093-1095

  Mooney, P M ^a   Cohen, G M ^a   Chu, J O ^a   Murray, C E ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC STRAIN RELAXATION; FORCE-BALANCE MODEL;

CHEMICAL VAPOR DEPOSITION; ELASTICITY; ELECTRON MOBILITY; EPITAXIAL GROWTH; MODULATION; OXIDATION; SCANNING ELECTRON MICROSCOPY; STRAIN;

SILICON;

EID: 1542784446     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646464     Document Type: Article

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