Dose retention effects in atomic boron and clusterBoron™ (B 18H22) implant processes

AIP Conference Proceedings

Volumn 866, Issue , 2006, Pages 155-158

  Harris, Mark A ^a   Rubin, L ^a   Tieger, D ^a   Venezia, V ^a   Hsieh, T J ^a   Miranda, J ^a   Jacobson, D ^b  

^a AXCELIS TECHNOLOGIES   (United States)

^b Ceradyne Inc   (United States)

Author keywords

B18H22; Molecular implantation; Octadecaborane; Poly gate doping; Sputtering

Indexed keywords

EID: 33847003044     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2401483     Document Type: Conference Paper

References (11)

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