Sputtering of Si with decaborane cluster ions

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 583-586

  Li, Cheng ^a   Gladczuk, Leszek ^a   Sosnowski, Marek ^a   Albano, Maria A ^b   Gossmann, Hans Joachim L ^c   Jacobson, Dale C ^d  

^a NEW JERSEY INSTITUTE OF TECHNOLOGY   (United States)

^b Applied Optronics Corp   (United States)

^c AGERE SYSTEMS   (United States)

^d Ceradyne Inc   (United States)

Author keywords

cluster ions; decaborane; sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION IMPLANTATION; MOS DEVICES; SILICON; SPUTTERING;

BEAM ENERGIES; CLUSTER IONS; COMPLEX IONS; DECABORANES; SHALLOW IMPLANTATION; SHALLOW JUNCTION; SPUTTERING YIELDS;

IONS;

EID: 84961319940     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1258072     Document Type: Conference Paper

References (10)

1. K. Goto, J. Matsuo, T. Sugii, I. Yamada, and T. Hisatsugu, IEDM-96, IEEE, 768-771 (1997).
2. D. C. Jacobson, K. Bourdelle, H. J. Gossmann, M. Sosnowski, M. A. Albano, V. Babaram, J. M. Poate, A. Agarwal, A. Perel, and T. Horsky, in Proceedings of the 2000 International Conference on Ion Implantation Technology, edited by H. Ryssel, L. Frey, J. Gyulai, and H. Glawischnig (IEEE, Piscataway, NJ, 2000), pp. 300-303.
3. A. S. Perel, W. Krull, and D. Hoglund, in Proceedings of the 2000 International Conference on Ion Implantation Technology, edited by H. Ryssel, L. Frey, J. Gyulai, and H. Glawischnig (IEEE, Piscataway, NJ, 2000), pp. 304-307.
4. I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, and N. Toyoda, J. Vac. Sci. Technol. A 14, 781 (1996).
5. M. Sosnowski, M. A. Albano, V. Babaram, R. Gurudath, J. M. Poate, and D. C. Jacobson, J. Electrochem. Soc. 147, 4329 (2000).
6. M. Thompson and L. Doolittle, computer code RUMP (Computer Graphic Service, Ithaca, NY, 1999).
7. Y. Yamamura, M. Natsunami, and N. Itoh, Radiat. Eff. 71, 65 (1983).
8. N. Matsunami, Y. Yamamura, Y. Itakawa, N. Itoh, Y. Kazumata, S. Miyagawa, K. Morita, R. Shimizu, and H. Tawara, Nucl. Data Tables 31, 1 (1984).
9. I. Yamada, W. L. Brown, J. A. Northby, and M. Sosnowski, Nucl. Instrum. Methods Phys. Res. B 79, 223 (1993).
10. A. Agarwal, H. J. Gossmann, D. C. Jacobson, D. J. Eaglesham, M. Sosnowski, J. M. Poate, I. Yamada, J. Matsuo, and T. E. Haynes, Appl. Phys. Lett. 5, 2015 (1998).