Decaborane ion implantation

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 2000, Pages 304-307

  Perel, Alex S ^a   Krull, Wade ^a   Hoglund, David ^a   Jackson, Keith ^b   Horsky, Tom ^c  

^a AXCELIS TECHNOLOGIES   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^c Brooks Automation Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON ATOM; DECABORANES; EQUIVALENT ENERGY; FEED MATERIALS; HIGH CURRENTS; HIGH RESOLUTION; IMPLANT ENERGY; IMPLANTED WAFERS; INTEGRATED CIRCUIT DEVICES; ION IMPLANTERS; LOW ENERGY BEAMS; NOVEL TECHNIQUES; SIMS PROFILE; SURFACE RESISTIVITY; ULTRA LOW ENERGY;

BORON; BORON COMPOUNDS;

ION IMPLANTATION;

EID: 78649823431     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/.2000.924149     Document Type: Conference Paper

References (6)

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