Transient enhanced diffusion from implantation of molecular decaborane ions

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 857-860

  Agarwal, Aditya ^a   Gossmann, H J ^a   Jacobson, D C ^a   Eaglesham, D J ^a   Sosnowski, M ^a   Poate, J M ^a   Yamada, I ^a   Matsuo, J ^a   Haynes, T E ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; COMPOSITION EFFECTS; DIFFUSION IN SOLIDS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING BORON; SUPERLATTICES; TRANSMISSION ELECTRON MICROSCOPY;

NUCLEAR REACTION ANALYSIS; TRANSIENT ENHANCED DIFFUSION (TED);

ION IMPLANTATION;

EID: 0033354447     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)