Slip correction measurements of certified PSL nanoparticles using a nanometer differential mobility analyzer (Nano-DMA) for knudsen number from 0.5 to 83

Journal of Research of the National Institute of Standards and Technology

Volumn 110, Issue 1, 2005, Pages 31-54

  Kim, Jung Hyeun ^a   Mulholland, George W ^b   Kukuck, Scott R ^b   Pui, David Y H ^a  

^a University of Minnesota   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Electrospray; Knudsen number; NMDA; Polystyrene latex particles; Slip correction factor

Indexed keywords

AEROSOLS; COMPUTATIONAL GEOMETRY; CONDENSATION; DRAG; ELECTRIC POTENTIAL; ELECTRON MOBILITY; IMPURITIES; LATEXES; POLYSTYRENES; PRESSURE EFFECTS; SLIP FORMING; VISCOSITY;

ELECTROSPRAY; KNUDSEN NUMBER; NANO-DIFFERENTIAL MOBILITY ANALYZER (NMDA); POLYSTYRENE LATEX PARTICLES; SLIP CORRECTION FACTORS;

NANOSTRUCTURED MATERIALS;

EID: 17444393169     PISSN: 1044677X     EISSN: None     Source Type: Journal    
DOI: 10.6028/jres.110.005     Document Type: Article

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