Advanced femtosecond DUV laser mask repair tool for large area photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Treyger, Leon ^a   Heyl, Jon ^a   Fink, Michael ^a   Koren, Iztok ^a   Li, Yonggang ^a,c   Ronning, Donald ^b   Small, Farrell ^a   Xian, Bin ^a  

^a Controlled Semiconductor Inc ^*  (United States)

^b Lite Enterprises   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

Ablation; CVD; Defect; DUV femtosecond laser; Gantry; LCD photomask repair

Indexed keywords

CHEMICAL VAPOR DEPOSITION; LASER ABLATION; LASER PULSES; REPAIR; SEMICONDUCTOR DEVICE MANUFACTURE;

BINARY PHOTOMASKS; DESIGN PARAMETERS; DUV FEMTOSECOND LASERS; LCD PHOTOMASK REPAIR; MASK DEFECTS;

MASKS;

EID: 33846576677     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686505     Document Type: Conference Paper

References (17)

1. J. O'Connor, Z. Drozdowicz, and J. Tison, "Next generation laser-based niask repair tool", Proc. SPIE 1604, 167-178 (1991)
2. J. K. Tison and John M. O'Connor, "Status and trends of laser mask repair technologies", Proc. SPIE 1809, 182-186 (1992)
3. Y. Chuang, B. Yang, V. Garkavy, J. O'Connor, K. Liu, and M. G. Cohen, "Laser Repair of Phase Shifting Masks", Proc. SPIE 2087, 258-267 (1993)
4. Y. A. Borodovsky et. al., "Lithography strategy for 65-nm node", Proc. SPIE 4754, 1-14 (2002)
5. T. Robinson, A. Dinsdale, R. Bozak, R. White, D. A. Lee, and K. Roessler, "Mask Repair for the 65 nm Technology Node", Proc. SPIE 5992, 59924Z (2005)
6. K. Edinger, V. Boegli, and W. Degel, "Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool" Proc. SPIE 5853, 361-370 (2005)
7. "LCD Photomask Defect Repair System", Semiconductor International (Japan, ed.), Jan. 2006, vol.3
8. R. Haight, A. Wagner, P. Longo, and D. Lim, "Femtosecond laser ablation and deposition of metal films on transparent substrates with applications in photomask repair", Proc. SPIE 5714, 24-36 (2005)
9. K. Yosuke, "Laser mask repair systems for the recent semiconductor and LCD manufacturing", The Review of Laser Engineering (Japan, ed.), 33 (7), 428-432 (2005)
10. B. E. Boerger, M. Yu, R. A. Selzer, Y. Ma, D. Ronning, D. Ducharme, B. J. Grenon, and M. J. Trybendis, "Advanced x-ray mask inspection system (AXIS) using scanning electron microscopy for sub-70 nm die-to-database inspections", Proc. SPIE 6152, 6152 IN (2006)
11. T. Togawa, A. Ueda, Y. Morishige, and Y. Suzuki, "Picosecond-laser system for photomask repair with nanometer accuracy", Proc. of SPIE 4830, 347-351 (2003)
12. R. Haight, D. Hayden, P. Longo, T. Neary, A. Wagner, "MARS: Femtosecond laser mask advanced repair system in manufacturing", J. Vac. Sci. Technol. B 17(6), 3137-3143 (1999)
13. K. Mukaihara, M. Yoshioka, S. Ito, and Y. Suzuki, "351 nm femtosecond laser with Nd:glass regenerative amplifier for thin films ablation", Proc. SPIE 6108, 610810 (2006)
14. A. Wagner, R. Haight, and P. Lon, "MARS2: An Advanced Femtosecond Laser Mask Repair Tool", Proc. SPIE 4889, 457-468 (2002)
15. K. Lieberman, Y. Shani, I. Melnik, S. Yoffe, and Y. Sharon, "Near-field optical photomask repair with a femtosecond laser", J. Microscopy 194 (2/3), 537-541 (1999)
16. T. Togawa, A. Ueda, Y. Morishige, and Y. Suzuki, "Picosecond-laser system for photomask repair with nanometer accuracy", Proc. SPIE 4830, 347-351 (2003)
17. R. Haight, P. Longo, and A. Wagner, "Metal deposition with femtosecond light pulses at atmospheric pressure", J. Vac. Sci. Technol. A 21(3), 649-652 (2003)