MARS: Femtosecond laser mask advanced repair system in manufacturing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3137-3143

  Haight, Richard ^a   Hayden, Dennis ^b   Longo, Peter ^a   Neary, Timothy ^b   Wagner, Alfred ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033269529     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590968     Document Type: Article

References (11)

1. P. Van, Q. Qian, J. McCall, J. Langston, Y. Ger, J. Cho, and B. Hainsey, Proc. SPIE 2621, 158 (1995).
2. A. Wagner, Nucl. Instrum. Methods 218, 355 (1983).
3. C. Korner, R. Mayerhofer, M. Hartmann, and H. W. Bergmann, Appl. Phys. A: Mater. Sci. Process. 63, 123 (1996).
4. B. N. Chichkov, C. Momma, S. Nolte, F. von Alvensleben, and A. Tunnermann, Appl. Phys. A: Mater. Sci. Process. 63, 109 (1996).
5. P. P. Pronko, S. K. Dutta, D. Du, and R. K. Singh, J. Appl. Phys. 78, 6233 (1995).
6. B. C. Stuart, M. D. Feit, A. M. Rubenchik, B. W. Shore, and M. D. Perry, Phys. Rev. Lett. 74, 2248 (1995).
7. A. Rundquist, C. Durfee, Z. Chang, G. Taft, E. Zeek, S. Backus, M. M. Murnane, H. C. Kapteyn, I. Christov, and V. Stoev, Appl. Phys. B: Lasers Opt. 65, 161 (1997).
8. R. W. Falcone, S. P. Gordon, H. Hamster, A. Sullivan, and T. Donnelly, Proc. SPIE 2012, 242 (1994).
9. C. Zenghu, A. Rundquist, W. Haiwen, M. M. Murnane, and H. C. Kapteyn, Phys. Rev. Lett. 79, 2967 (1997).
10. R. Haight, Surf. Sci. Rep. 21, 275 (1995).
11. R. M. Kurtz and T. Juhasz, Proc. SPIE 3269, 76 (1998).