Performance results from the Zeiss/NaWoTec MeRit MG electron beam mask repair tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 361-370

  Edinger, Klaus ^a   Boegli, Volker ^b   Degel, Wolfgang ^b  

^a NaWoTec GmbH   (Germany)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Binary mask; Electron beam; Electron beam induced reaction; Mask repair; Phase shift mask; Photomask; PSM; Reticle

Indexed keywords

ELECTRON BEAMS; NANOTECHNOLOGY; PHASE SHIFT; PHOTOLITHOGRAPHY;

BINARY MASK; ELECTRON BEAM INDUCED REACTION; MASK REPAIR; PHASE SHIFT MASK (PSM); PHOTOMASKS; RETICLE;

MASKS;

EID: 28544452441     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617495     Document Type: Conference Paper

References (3)

1. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-165, 2004.
2. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-03, 2004
3. th Annual BACUS Symposium on Photomask Technology, Proc. SPIE Vol. 5567, paper 5567-49, 2004