Mask repair for the 65 nm technology node

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Robinson, Tod ^a   Dinsdale, Andrew ^a   Bozak, Ron ^a   White, Roy ^a   Lee, David A ^a   Roessler, Ken ^a  

^a RAVE LLC   (United States)

Author keywords

Mask Repair; Nanomachining; Photomask

Indexed keywords

MASK REPAIR; NANOMACHINING; PHOTOMASK;

DEFECTS; IMAGING TECHNIQUES; TECHNOLOGY;

MASKS;

EID: 33644595049     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.634758     Document Type: Conference Paper

References (5)

1. Yasutaka Morikawa, Haruo Kokubo, Naoya Hayashi, Roy While, "Alternating-PSM repair by nanomachining", Vol. 12 Issue 4, Micolithography World, November 1, 2003, http://sst.pennnet.com/Articles/ Arlicle_Display.cfm?Section=ARTCL&ARTICLE_ID=190518&VERSION_NUM=1&p= 28
2. Bob LoBianco, Roy White, Ted Nawrocki, "Use of Nanomachining for 100 Nanometer Mask Repair", http://www.ravenano.com/pdfs/100nanometer.pdf
3. David Brinkley, Ron Bozak, Bin Chiu, Chanh Ly, Vikram Tolani, Roy White, "Investigation of Nanomachining as a Technique for Geometry Reconstruction", http://www.ravenano.com/pdfs/reconstruction.pdf
4. Roy White, Martin Verbeek, Ron Bozak, Marty Klos, "Use of Nanomachining as a Technique to Reduce Scrap of High End Photomasks", http://www.ravenano.com/pdfs/bacus2001manuscript.pdf
5. 2004 ITRS Roadmap, http://www.itrs.net/Common/2004Update/2004Update.htm