Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5298-5301

  Gao, Peng ^a   Xu, Jun ^a   Piao, Yong ^a   Ding, Wanyu ^a   Wang, Dehe ^a   Deng, Xinlu ^a   Dong, Chuang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

ECR; Magnetron sputtering; Silicon carbon nitride

Indexed keywords

HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; SILICON COMPOUNDS; STRUCTURE (COMPOSITION); THIN FILMS;

NANOINDENTATION; OPTICAL GAP VALUE; SILICON CARBON NITRIDE;

ELECTRON CYCLOTRON RESONANCE;

ELECTRON CYCLOTRON RESONANCE; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; OPTICAL PROPERTIES; SILICON COMPOUNDS; STRUCTURE (COMPOSITION); THIN FILMS;

EID: 33846471010     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.197     Document Type: Article

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