Challenges for plasma etch integration of ferroelectric capacitors in FeRAM's and DRAM's

Integrated Ferroelectrics

Volumn 17, Issue 1-4, 1997, Pages 395-402

  DeOrnellas, Steve ^a   Rajora, Paritosh ^a   Cofer, Alferd ^a  

^a Tegal   (United States)

Author keywords

BST; DRAM; FeRAM; Ferroelectric capacitors; Integration; Iridium; Plasma etch; Platinum; PZT; Y1

Indexed keywords

CAPACITORS; DIELECTRIC FILMS; ELECTRODES; IRIDIUM; LEAD COMPOUNDS; PLASMA ETCHING; PLATINUM; RANDOM ACCESS STORAGE;

HIGH DENSITY REFLECTED ELECTRON ETCH SYSTEM;

FERROELECTRIC DEVICES;

EID: 0031339683     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708013014     Document Type: Article

References (2)

1. T. C. Taylor, H.A. Harper presented at Tegal 20th Annual Plasma Seminar Proceedings, San Francisco, Ca. (July, 1994) Chemically Assisted Etching of PZT-Based Ferroelectric Dielectric and Noble Metal Capacitor Electrodes.
2. 3/Ru Stacked Capacitors Using X-ray Lithography.