Fast and efficient bright-field AAPSM conflict detection and correction

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Volumn 26, Issue 1, 2007, Pages 115-126

  Chiang, Charles ^b   Kahng, Andrew B ^a,c   Sinha, Subarnarekha ^b   Xu, Xu ^a,d   Zelikovsky, Alexander Z ^e  

^a IEEE

^b SYNOPSYS INC   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d Blaze DfM   (United States)

^e GEORGIA STATE UNIVERSITY   (United States)

Author keywords

Automatic layout; Phase conflict; Phase shift mask; Resolution enhancement

Indexed keywords

COMPUTER AIDED DESIGN; CONSTRAINT THEORY; INTEGRATED CIRCUIT LAYOUT; PHASE SHIFT; PHOTOLITHOGRAPHY; POLYSILICON;

AUTOMATIC LAYOUT; GRAPH BIPARTIZATION PROBLEMS; PHASE CONFLICTS; PHASE-SHIFT MASKS; RESOLUTION ENHANCEMENTS;

MASKS;

EID: 33846264884     PISSN: 02780070     EISSN: None     Source Type: Journal    
DOI: 10.1109/TCAD.2006.882642     Document Type: Article

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