Full phase-shifting methodology for 65nm node lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 282-293

  Pierrat, Christophe ^a   Driessen, Frank ^a   Vandenberghe, Geert ^b  

^a SYNOPSYS INC   (United States)

^b IMEC   (Belgium)

Author keywords

Data conversion; Double exposure; OPC; Phase conflict; Phase shifting mask; PSM; RET

Indexed keywords

COMPUTER SIMULATION; INTEGRATED CIRCUITS; MASKS; PHASE SHIFT;

BINARY MASK EXPOSURE; PHASE SHIFTING MASK;

LITHOGRAPHY;

EID: 0141499007     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485440     Document Type: Conference Paper

References (2)

1. C. Pierrat et al., SPIE vol. 4691, pp. 325-335, 2002.
2. M.E. Kling et al., SPIE vol. 3679, pp. 10-17, 1999.