PsmLint: Bringing AltPSM Benefits to the IC Design Phase

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5042, Issue , 2003, Pages 314-325

  Ghosh, Pradiptya ^a   Kang, Chung Shin ^a   Sanie, Michael ^a   Huckabay, Judy ^b  

^a SYNOPSYS INC   (United States)

^b CADENCE DESIGN SYSTEMS   (United States)

Author keywords

65 nm; 90 nm; Alternating phase shift mask; AltPSM; DFM; EDA; Lithography; MEEF; Numerical; OPC; Optical proximity correction; Photomask; PSM; PsmLint; RET; Shifter; Subwavelength

Indexed keywords

ETCHING; GATES (TRANSISTOR); LITHOGRAPHY; PHASE SHIFT; TOPOLOGY;

OPTICAL PROXIMITY CORRECTION (OPC);

INTEGRATED CIRCUITS;

EID: 0242441066     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485253     Document Type: Conference Paper

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