RIE of GaSb with an ECR Source Using Methane/Hydrogen Chemistry in an Argon Plasma

Journal of the Electrochemical Society

Volumn 154, Issue 2, 2007, Pages

  Mohammedy, F M ^a   Peng, Z L ^a   Thompson, D A ^a   Deen, M J ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRON CYCLOTRON RESONANCE; ETCHING; GEOMETRY; METHANE; MICROWAVES; MORPHOLOGY;

ARGON PLASMA; MASK EROSION; REACTIVE ION ETCHING (RIE); VERTICAL SIDEWALLS;

GALLIUM COMPOUNDS;

EID: 33846260854     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2405724     Document Type: Article

References (22)

1. H. Kroemer, Physica E (Amsterdam), 20, 196 (2004).
2. P. S. Dutta, H. L. Bhat, and V. Kumar, J. Appl. Phys., 81, 5821 (1997).
3. F. M. Mohammedy, O. Hulko, B. J. Robinson, D. A. Thompson, M. J. Deen, and J. G. Simmons, J. Vac. Sci. Technol. A, 24, 587 (2006).
4. B. R. Bennett, R. Magno, J. B. Boos, W. Kruppa, and M. G. Ancona, Solid-State Electron., 49, 1875 (2005).
5. O. Dier, C. Lin, M. Grau, and M. C. Amann, Semicond. Sci. Technol., 19, 1250 (2004).
6. G. C. DeSalvo, R. Kaspi, and C. A. Bozada, J. Electrochem. Soc., 141, 3526 (1994).
7. J. P. Langer and P. S. Dutta, J. Vac. Sci. Technol. B, 21, 1511 (2003).
8. A. R. Giehl, M. Gumbel, M. Kessler, N. Herhammer, G. Hoffmann, and H. Fouckhardt, J. Vac. Sci. Technol. B, 21, 2393 (2003).
9. S. S. Ou, J. Vac. Sci. Technol. B, 14, 3226 (1996).
10. G. Morello, M. Quaglio, G. Meneghini, C. Papuzza, and C. Kompocholis, J. Vac. Sci. Technol. B, 24, 756 (2006).
11. J. R. Mileham, J. W. Lee, E. S. Lambers, and S. J. Pearton, Semicond. Sci. Technol., 12, 338 (1997).
12. A. Semu and P. Silverberg, Semicond. Sci. Technol., 6, 287 (1991).
13. J. Werking, J. Schramm, C. Nguyen, E. L. Hu, and H. Kroemer, Appl. Phys. Lett., 58, 2003 (1991).
14. J. W. Lee, C. R. Abernathy, S. J. Pearton, C. Constantine, R. J. Shul, and W. S. Hobson, Plasma Sources Sci. Technol., 6, 499 (1997).
15. J. Asmussen, J. Vac. Sci. Technol. A, 7, 883 (1989).
16. D. L. Melville, J. G. Simmons, and D. A. Thompson, J. Vac. Sci. Technol. B, 11, 2038 (1993).
17. D. L. Melville, D. A. Thompson, and J. G. Simmons, J. Electrochem. Soc., 142, 2762 (1995).
18. S. J. Pearton, T. A. Keel, A. Katz, and F. Ren, Semicond. Sci. Technol., 8, 1889 (1993).
19. B. Chapman, Glow Discharge Processes, John Wiley & Sons, New York (1980).
20. J. Kaindl, S. Sotier, and G. Franz, J. Electrochem. Soc., 142, 2418 (1995).
21. G. W. Reynolds, J. W. Taylor, and C. J. Brooks, J. Vac. Sci. Technol. B, 17, 3420 (1999).
22. S. J. Pearton, J. W. Lee, E. S. Lambers, C. R. Abernathy, F. Ren, W. S. Hobson, and R. J. Shul, J. Electrochem. Soc., 143, 752 (1996).