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Applied Physics A: Materials Science and Processing

Volumn 86, Issue 3, 2007, Pages 409-414

Using IR laser radiation for backside etching of fused silica

(3) Zimmer, K a Bohme R a Rauschenbach, B a

a LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; INFRARED RADIATION; MELTING; PHASE INTERFACES; PULSED LASER APPLICATIONS; SURFACE TOPOGRAPHY;

BACKSIDE ETCHING; ETCHED SURFACE TOPOGRAPHY; LASER HEATING; PULSED INFRARED LASER RADIATION;

FUSED SILICA;

EID: 33846144161 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-006-3794-7 Document Type: Article

Times cited : (24)

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