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Electrochemical and Solid-State Letters

Volumn 10, Issue 2, 2007, Pages

The effect of surface cleaning on current collapse in AlGaNGaN HEMTs

(8) Bardwell, J A a,b Haffouz, S a McKinnon, W R a Storey, C a Tang, H a Sproule, G I a Roth, D a Wang, R a

a NATIONAL RESEARCH COUNCIL CANADA (Canada)

b ELECTROCHEMICAL SOCIETY (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

PASSIVATION LAYERS; PLASMA DESCUM; RESIDUAL CARBON;

AUGER ELECTRON SPECTROSCOPY; ELECTRIC CURRENTS; HYDROCHLORIC ACID; PASSIVATION; SEMICONDUCTING ALUMINUM COMPOUNDS; SILICON NITRIDE; SILICON WAFERS; SURFACE CLEANING;

HIGH ELECTRON MOBILITY TRANSISTORS;

EID: 33845962776 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2402479 Document Type: Article

Times cited : (18)

References (12)

1
- 10844255004
- O. Mitrofanov and M. Manfra, Superlattices Microstruct., 34, 33 (2003).
- (2003) Superlattices Microstruct. , vol.34 , pp. 33
- Mitrofanov, O.¹ Manfra, M.²

2
- 0033738001
- B. M. Green, K. K. Chu, E. M. Chumbes, J. A. Smart, J. R. Shealy, and L. F. Eastman, IEEE Electron Device Lett., 21, 268 (2000).
- (2000) IEEE Electron Device Lett. , vol.21 , pp. 268
- Green, B.M.¹ Chu, K.K.² Chumbes, E.M.³ Smart, J.A.⁴ Shealy, J.R.⁵ Eastman, L.F.⁶

3
- 23944494923
- D. Mistele, O. Katz, A. Horn, G. Bahir, and J. Salzman, Phys. Status Solidi C, 2, 2627 (2005).
- (2005) Phys. Status Solidi C , vol.2 , pp. 2627
- Mistele, D.¹ Katz, O.² Horn, A.³ Bahir, G.⁴ Salzman, J.⁵

4
- 33645532053
- D. W. DiSanto, H. F. Sun, and C. R. Bolognesi, Appl. Phys. Lett., 88, 013504 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 013504
- Disanto, D.W.¹ Sun, H.F.² Bolognesi, C.R.³

5
- 0348041879
- N. A. Moser, J. K. Gillespie, G. D. Via, A. Crespo, M. J. Yannuzzi, G. H. Jessen, R. C. Fitch, B. Luo, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, and S. J. Pearton, Appl. Phys. Lett., 83, 4178 (2003).
- (2003) Appl. Phys. Lett. , vol.83 , pp. 4178
- Moser, N.A.¹ Gillespie, J.K.² Via, G.D.³ Crespo, A.⁴ Yannuzzi, M.J.⁵ Jessen, G.H.⁶ Fitch, R.C.⁷ Luo, B.⁸ Ren, F.⁹ Gila, B.P.¹⁰ Onstine, A.H.¹¹ Abernathy, C.R.¹² Pearton, S.J.¹³

6
- 3342926149
- T. Hashizume and H. Hasegawa, Appl. Surf. Sci., 234, 387 (2004).
- (2004) Appl. Surf. Sci. , vol.234 , pp. 387
- Hashizume, T.¹ Hasegawa, H.²

7
- 14844304370
- S. Haffouz, H. Tang, J. A. Bardwell, E. M. Hsu, J. B. Webb, and S. Rolfe, Solid-State Electron., 49, 802 (2005).
- (2005) Solid-State Electron. , vol.49 , pp. 802
- Haffouz, S.¹ Tang, H.² Bardwell, J.A.³ Hsu, E.M.⁴ Webb, J.B.⁵ Rolfe, S.⁶

8
- 0034155668
- J. A. Bardwell, I. Foulds, B. Lamontagne, H. Tang, J. B. Webb, P. Marshall, S. J. Rolfe, J. Stapledon, and T. W. MacElwee, J. Vac. Sci. Technol. A, 18, 750 (2000).
- (2000) J. Vac. Sci. Technol. A , vol.18 , pp. 750
- Bardwell, J.A.¹ Foulds, I.² Lamontagne, B.³ Tang, H.⁴ Webb, J.B.⁵ Marshall, P.⁶ Rolfe, S.J.⁷ Stapledon, J.⁸ MacElwee, T.W.⁹

9
- 33745513254
- J. A. Bardwell, S. Haffouz, H. Tang, and R. Wang, J. Electrochem. Soc., 153, G746 (2006).
- (2006) J. Electrochem. Soc. , vol.153 , pp. 746
- Bardwell, J.A.¹ Haffouz, S.² Tang, H.³ Wang, R.⁴

10
- 2442516455
- J. Bernát, P. Javorka, A. Fox, M. Marso, A. Fox, and P. Kordoš, J. Electron. Mater., 33, 436 (2004).
- (2004) J. Electron. Mater. , vol.33 , pp. 436
- Bernát, J.¹ Javorka, P.² Fox, A.³ Marso, M.⁴ Fox, A.⁵ Kordoš, P.⁶

11
- 33645974309
- W. Wang, J. Derluyn, M. Germain, M. Leys, S. Degroote, D. Schreurs, and G. Borghs, Jpn. J. Appl. Phys., Part 2, 45, L224 (2006).
- (2006) Jpn. J. Appl. Phys., Part 2 , vol.45 , pp. 224
- Wang, W.¹ Derluyn, J.² Germain, M.³ Leys, M.⁴ Degroote, S.⁵ Schreurs, D.⁶ Borghs, G.⁷

12
- 0003930829
- Artech House, Boston
- R. Williams, Modern GaAs Processing Methods, p. 93, Artech House, Boston (1990).
- (1990) Modern GaAs Processing Methods , pp. 93
- Williams, R.¹

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