Growth of silicon nanoclusters on different substrates by plasma enhanced chemical vapor deposition

Journal of Nanoscience and Nanotechnology

Volumn 6, Issue 12, 2006, Pages 3752-3755

  Monroy, B M ^a   Santana, G ^a   Fandino J ^a   Ortiz, A ^a   Alonso, J C ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

Growth, substrates; PECVD; Silicon nanoclusters

Indexed keywords

GROWTH, SUBSTRATES; SILICON NANOCLUSTERS; SURFACE QUALITY;

FUSED SILICA; HYDROGEN; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON NITRIDE; SUBSTRATES;

SEMICONDUCTOR GROWTH;

MONOSILANE; NANOMATERIAL; SILANE DERIVATIVE; SILICON; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; GAS; HEAT; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ADSORPTION; CRYSTALLIZATION; GASES; HEAT; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; SILANES; SILICON; SURFACE PROPERTIES;

EID: 33845800988     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2006.614     Document Type: Conference Paper

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