Growth kinetics of nanocrystalline silicon from SiH2Cl2 by plasma-enhanced chemical vapor deposition

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 131-135

  Shirai, Hajime ^a   Fukai, Chisato ^a   Sakuma, Yoshikazu ^a   Moriya, Yoshimizu ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001520870     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00776-0     Document Type: Article

References (8)

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