Formation of nanocrystalline silicon dots from chlorinated materials by RF plasma-enhanced chemical vapor deposition

Thin Solid Films

Volumn 407, Issue 1-2, 2002, Pages 12-17

  Shirai, Hajime ^a   Fujimura, Yukihiro ^a   Jung, Sughoan ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

AFM; nc Si:H(Cl); Si dot; SiCl4; SiH2Cl2

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHLORINATION; FILM GROWTH; LOW TEMPERATURE OPERATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SEMICONDUCTOR QUANTUM DOTS; STABILITY; SUBSTRATES; SURFACE CHEMISTRY;

NANOCRYSTALLINE SILICON DOTS;

NANOSTRUCTURED MATERIALS;

EID: 0037155458     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00005-6     Document Type: Conference Paper

References (12)